Plasma Enhanced Chemical Vapor Deposition (PECVD) is the process that, based on the Chemical Vapor Deposition (CVD) technology, ionizes the reactive gas into plasma through an HF power source, and then a chemical reaction occurs, and the required film is formed on the substrate surface. It can be used to prepare the solid film of high purity, high performance.
LHQ-200 has the advantages of stable performance, wide range of film formation, good repeatability and so on. It can be used to prepare various kinds of thin films, and is one of the basic apparatuses for the preparation of lab films.
● It consists of reaction chamber, vacuum acquisition system, lower electrode, RF power supply and matcher, reaction gas path and mass flowmeter, vacuum detection system, electrical control system, control software and so on.
● It can deposit such film materials as SiO2, SiNx, amorphous silicon, polysilicon, α-C, low-k, etc.
● It is configured with two-stage uniform gas structure, benefiting the acquisition of high-quality films.
● The reaction chamber is made of corrosion-resistant material, which can guarantee the vacuum performance of the chamber.
● The vacuum acquisition system can be made up of corrosion-resistant high-end dry pump, molecular pump (optional) and so on, which can be combined flexibly according to the user’s needs.
● The lower electrode has the function of heating and is suitable for the samples of 200 mm and less.
● It adopts imported RF power supply and is equipped with automatic matcher.
● It can be flexibly configured with process gas according to user needs and is equipped with imported high-precision mass flowmeter to accurately control reaction gas flow rate.
● It is configured with high-precision process vacuum gauge and integrated pressure regulating valve to precisely control system pressure.
● It has automatic process and process database and provides recommended process menus.
● The security mechanism of the machine is composed of two levels of soft and hard interlock. It is equipped with interlocking, alarm and other security measures.
● It has the dry cleaning function to avoid chamber pollution.
[Product Configuration and Specifications]
● Reaction chamber: 1 set;
● Vacuum acquisition system: 1 set
● Lower electrode: 1 set
● RF power supply and matcher: 1 set, frequency 13.56MHz
● Reaction gas path and mass flowmeter: configured according to user needs
● Vacuum testing system: 1 set
● Electrical control system: 1 set
● Control software: 1 set
● Loadlock automatic transmission system: optional
● LF/RF power supply: optional
It is applied to integrated circuit, semiconductor lighting, MEMS, power semiconductor, compound semiconductor, new energy PV and other fields.