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Kessel™ Pishow® M

8" Metal Etching System

Inductively Coupled Plasma Etching (ICP) | Strip



System Features

  • The Kessel™ Pishow® M system is intended for volume production of 8" IC wafers
  • Consists of ICP etch chambers, strip chambers, a cooling chamber, and a transfer module
  • Ideal for aluminum pad etch and tungsten recess all the way down to the 0.11 μm generation
  • Also provides 6" options

Process Data

Al Pad

Al Line

W Recess

Overview

The Kessel™ Pishow® M metal etching system is a cluster tool for 8" IC back-end-of-line (BEOL) aluminum processes. The optimized design of this proprietary system offers excellent etch uniformity (< 8% within wafer, and < 5% wafer to wafer) and great particle control.

In 4 μm aluminum pad etch applications, Kessel™ Pishow® M has a throughput of up to 8,000 wafers per month. This system offers cost-effective solutions and has a small footprint, greatly enhances process throughput and production capacity.

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